Paper Published on “Selective atomic layer deposition on flexible polymeric substrates employing a polyimide adhesive as a physical mask”

Matin Forouzmehr, ESR 3, has published the article “Selective atomic layer deposition on flexible polymeric substrates employing a polyimide adhesive as a physical mask” last year in which, he tries to experimentally investigate the possibility of selective deposition on elastic substrates using ALD.
According to the article, a simple method of using a physical mask to block the film growth in selected polymeric and flexible substrate during a low temperature low pressure ALD process has been demonstrated.

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